Healthcare Leaders Across India Bring NVIDIA NIM for Hindi Language to LLM Applications

Healthcare Leaders Across India Bring NVIDIA NIM for Hindi Language to LLM Applications

Life sciences and healthcare organizations across India are using generative AI to build applications that can deliver life-saving impacts — within the country and across the globe. Among such leading organizations are research centers at the Indian Institute of Technology Madras (IIT Madras) and the Indraprastha Institute of Information Technology Delhi (IIIT-Delhi), intelligent life sciences … Read more

Sequence launches on Google Cloud Marketplace for Web3 gaming tech

Sequence launches on Google Cloud Marketplace for Web3 gaming tech

Sequence, the all-in-one platform for building Web3 games, has partnered with Google Cloud Marketplace to widen its reach to game developers. This milestone brings a comprehensive suite of Web3 development tools and solutions directly to game developers, simplifying the integration of blockchain technology into their games. Sequence will be listed on Google Cloud Marketplace as … Read more

New Approaches To Power Decoupling

New Approaches To Power Decoupling

Decoupling capacitors have long been an important aspect of maintaining a clean power source for integrated circuits, but with noise caused by rising clock frequencies, multiple power domains, and various types of advanced packaging, new approaches are needed. Power is a much more important factor than it used to be, especially in the era of … Read more

Does the iPad mini 7 (2024) have Face ID?

Does the iPad mini 7 (2024) have Face ID?

The diminutive iPad mini 7 (2024) is the newest addition to Apple’s expansive tablet lineup. It’s perfectly portable and pocket-sized, which makes it a fun-sized option that you can pop in your bag and take everywhere you go. And it’s also sporting a series of great future-proofing upgrades that make it a good investment for … Read more

Tuning Design And Process For High-NA EUV Stitching

Tuning Design And Process For High-NA EUV Stitching

By Kevin Lucas and James Ban Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, see figure 1. The lithography patterning at a stitching boundary between two mask exposures will be affected by additional process variation … Read more